Revolutionizing Silicon: The Synergy of Complex Oxides in Chip Technology

by Prof. Guus Rijnders

Aula Caianiello (Dipartimento di Fisica "Ettore Pancini")

Aula Caianiello

Dipartimento di Fisica "Ettore Pancini"


Guus Rijnders,
MESA+ Institute for Nanotechnology, University of Twente, 7500 AE Enschede, The Netherlands.


As the chip-tech industry continues to push the limits of traditional silicon technology, the exploration of alternative materials becomes imperative for achieving enhanced performance and functionality in for instance electronic and photonic devices. This presentation delves into the fascinating realm of complex oxide integration with silicon, unravelling the synergies that arise from combining these materials. Complex oxides, known for their multifunctional properties, bring a new dimension to silicon-based devices, offering opportunities for improved performance, energy efficiency, and novel functionalities.

The presentation will begin by providing an overview of complex oxides, highlighting their unique physical and electronic properties that distinguish them from conventional materials. The challenges associated with integrating complex oxides with silicon will be explored and innovative strategies to overcome these hurdles will be discussed. Emphasis will be placed on recent breakthroughs in material science and fabrication techniques that enable the seamless integration of complex oxides into silicon-based architectures.

Furthermore, the discussion will delve into specific applications and use cases where complex oxide-silicon integration proves transformative. From high-performance transistors to emerging photonic devices and beyond, and how this integration unlocks new possibilities for electronic design and functionality. The potential for realizing novel device architectures, such as memristors and photonic devices, will be examined, shedding light on the promising avenues for future technological advancements. Lastly, the presentation will touch upon the implications of complex oxide integration for the chip-tech industry, addressing scalability and the manufacturability.

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